Fabrication and Electrowetting Properties of Poly Si Nanostructure Based Superhydrophobic Platform
| Autor: | R. T. Rajendrakumar, K. Rajkumar |
|---|---|
| Rok vydání: | 2013 |
| Předmět: |
Fabrication
Nanostructure Materials science business.industry General Chemical Engineering Nanotechnology General Chemistry Condensed Matter Physics Silane Surfaces Coatings and Films Contact angle chemistry.chemical_compound chemistry Electrode Electrowetting Optoelectronics Thin film Reactive-ion etching business |
| Zdroj: | Plasma Chemistry and Plasma Processing. 33:807-816 |
| ISSN: | 1572-8986 0272-4324 |
| DOI: | 10.1007/s11090-013-9462-8 |
| Popis: | Poly-silicon based superhydrophobic surface (water contact angle >150°) is being fabricated and its electrowetting properties have been studied. The polysilicon thin film has been deposited over patterned gold electrodes. The polysilicon film is structured to form nanoscale features using Reactive Ion Etching. A thin film of HfO2 high k-dielectric is deposited over the structured polysilicon surface. The surface was chemically modified with Trichloro (1H, 1H, 2H, 2H-perfluorooctyl) silane (PFOS). Such a surface showed Superhydrophobic behavior with water contact angle of 172° and roll off angle |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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