Development of nanoimprint lithography templates toward high-volume manufacturing
Autor: | Koji Ichimura, Naoya Hayashi, Masaaki Kurihara, Takaharu Nagai, Harada Saburo, Kouji Yoshida |
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Rok vydání: | 2016 |
Předmět: |
010302 applied physics
Fabrication Materials science Mechanical Engineering Nanotechnology Condensed Matter Physics 01 natural sciences Atomic and Molecular Physics and Optics High volume manufacturing Electronic Optical and Magnetic Materials Nanoimprint lithography law.invention 010309 optics Template law 0103 physical sciences Electrical and Electronic Engineering Photomask Lithography Critical dimension Ultraviolet radiation |
Zdroj: | Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:021006 |
ISSN: | 1932-5150 |
DOI: | 10.1117/1.jmm.15.2.021006 |
Popis: | Development of nanoimprint lithography (NIL) templates is discussed. The template fabrication process and its performance are presented with consideration of the requirements of NIL for high-volume manufacturing. Defectivity, image placement, and critical dimension uniformity are the three major performance parameters of the templates, and their current status is shown. |
Databáze: | OpenAIRE |
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