Development of nanoimprint lithography templates toward high-volume manufacturing

Autor: Koji Ichimura, Naoya Hayashi, Masaaki Kurihara, Takaharu Nagai, Harada Saburo, Kouji Yoshida
Rok vydání: 2016
Předmět:
Zdroj: Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:021006
ISSN: 1932-5150
DOI: 10.1117/1.jmm.15.2.021006
Popis: Development of nanoimprint lithography (NIL) templates is discussed. The template fabrication process and its performance are presented with consideration of the requirements of NIL for high-volume manufacturing. Defectivity, image placement, and critical dimension uniformity are the three major performance parameters of the templates, and their current status is shown.
Databáze: OpenAIRE