Effects of annealing on anodic oxides of GaP

Autor: Yoshimine Kato, R. G. Gann, Carl W. Wilmsen, Kent M. Geib, P. R. Brusenback
Rok vydání: 1991
Předmět:
Zdroj: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 9:1530
ISSN: 0734-211X
DOI: 10.1116/1.585461
Popis: The surface topography and the chemical composition of anodic oxides on GaP have been studied. The surface of the as grown anodic oxide was featureless but annealing at T≥600 °C causes the formation of hollow bumps and blisters which increase in size with temperature or duration of the anneal. The oxide composition was investigated by x‐ray photoelectron spectroscopy (XPS) and was found to be a nonuniform mixture of P2O5, Ga2O3, and GaPO4. There is some evaporation of phosphorus oxide near the surface when annealed at T≥300 °C but little or none from the bulk of the oxide film.The surface topography and the chemical composition of anodic oxides on GaP have been studied. The surface of the as grown anodic oxide was featureless but annealing at T≥600 °C causes the formation of hollow bumps and blisters which increase in size with temperature or duration of the anneal. The oxide composition was investigated by x‐ray photoelectron spectroscopy (XPS) and was found to be a nonuniform mixture of P2O5, Ga2O3, and GaPO4. There is some evaporation of phosphorus oxide near the surface when annealed at T≥300 °C but little or none from the bulk of the oxide film.
Databáze: OpenAIRE