Preparation and atomic oxygen erosion resistance of silica film formed on silicon rubber by sol–gel method
| Autor: | Mianjun Ma, Guangjuan Ren, Yuan Gao, An Xing, Huitao Liu, Jungang Yin |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
inorganic chemicals
Materials science Silicon Delamination technology industry and agriculture General Physics and Astronomy chemistry.chemical_element Infrared spectroscopy Mineralogy Surfaces and Interfaces General Chemistry Condensed Matter Physics complex mixtures Oxygen Surfaces Coatings and Films Chemical engineering chemistry Irradiation Thin film Fourier transform infrared spectroscopy Sol-gel |
| Zdroj: | Applied Surface Science. 256:6133-6138 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2010.03.133 |
| Popis: | Based on the characteristic that silicon coupling agents have the capability to develop ‘molecular bridge’ in the interface of organic materials and inorganic materials, silica films were prepared on the surface of flexible silicon rubber by sol–gel method and the optical transmittance of the sample before and after atomic oxygen irradiation was tested. The surface morphology and structure of silica films were investigated by scanning electronic microscope (SEM) and Fourier transformed infrared spectroscopy (FTIR). The results indicated that the silica sol could easily form a uniform thin film on the surface of silicon rubber pretreated by high concentration silicon coupling agents, and the inorganic silica films could combine with organic silicon rubber without obvious delamination on the interface. |
| Databáze: | OpenAIRE |
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