Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition
| Autor: | Yury Kuzminykh, Patrik Hoffmann, Michael Reinke |
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| Rok vydání: | 2015 |
| Předmět: |
Hybrid physical-chemical vapor deposition
Ultra-high vacuum Kinetics Chemical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Atomic layer deposition General Energy chemistry Chemical engineering Titanium dioxide Organic chemistry Physical and Theoretical Chemistry Thin film Titanium isopropoxide |
| Zdroj: | The Journal of Physical Chemistry C. 119:27965-27971 |
| ISSN: | 1932-7455 1932-7447 |
| Popis: | Understanding the surface kinetics of precursor decomposition during thin film formation represents a key aspect in the understanding and engineering of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. The determination of activation energies of the surface reaction steps, however, is often challenging because it requires precise knowledge of precursor impinging rates. Afterward, the kinetics can be investigated by comparing the amount of deposited material with the absolute precursor flow. Ideally, the experimental equipment allows a distinction between gas phase and surface reactions. Both are difficult to achieve in conventional CVD processes. A high vacuum environment, however, enables the quantitative prediction of precursor impinging rates due to the ballistic nature of precursor transport; additionally precursor gas phase reactions do not occur. We investigated the surface reaction kinetics of titanium isopropoxide (TTIP) in the high vacuum CVD of titanium dioxide. Addit... |
| Databáze: | OpenAIRE |
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