A 5 MeV RBS microprobe for materials analysis in the semiconductor industry

Autor: J.A. Ferry, G.M. Klody, E.D. Adams, J.B. Schroeder, T.J. Pollock
Rok vydání: 1991
Předmět:
Zdroj: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :704-707
ISSN: 0168-583X
Popis: In the development and manufacturing environment, there is a growing need for easy analysis of materials within sample regions smaller than 100 νm with automation for unattended multiple-sample analysis. A recently developed system with a new microprobe lens has been tested for industrial applications of microbeam RBS and channeling analysis. A 1.7 MV tandem accelerator, NEC Model 5SDH Pelletron, provides helium ions at energies up to 5.1 MeV. The new electrostatic quadrupole lens is fitted in a Charles Evans & Associates, Inc. Model RBS-400 end station. The accelerator, microprobe beamline, and end station are computer controlled for unattended, multiple sample analysis. We compare the performance of the microprobe lens to ion optic calculations and describe examples of applications.
Databáze: OpenAIRE