Room-temperature oxidation of ultrathin TiB2 films
| Autor: | J. F. Sullivan, John A. Barnard, Mark L. Weaver, Feng Huang, W. J. Liu |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
Materials science
Atomic force microscopy Mechanical Engineering Oxide Nanotechnology Condensed Matter Physics Reflectivity chemistry.chemical_compound X-ray photoelectron spectroscopy chemistry Mechanics of Materials General Materials Science Composite material Thin film Titanium diboride Oxidation resistance |
| Zdroj: | Journal of Materials Research. 17:805-813 |
| ISSN: | 2044-5326 0884-2914 |
| Popis: | Titanium diboride has been claimed as a very promising candidate material for protective applications in the magnetic recording. Its oxidation resistance at room temperature is a critical criterion in assessing this application potential. In this paper, the oxidation characteristics of ultrathin TiB2 thin films, such as overcoat erosion and oxide thickness, are investigated via a combination of x-ray reflectivity, x-ray photoelectron spectroscopy (XPS), and atomic force microscopy. It was found that a 2 overcoats, coupled with the existence of a sharp oxide/TiB2 interface. XPS studies confirmed the existence of the oxides. Considering the decreasing allowable thickness for such protective overcoats, oxidation and the resultant thickness gain negate such a potential of ultrathin TiB2 films. The results in our current report provide a new perspective on its potential as protective overcoats in magnetic recording. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink