Mechanism of N + NO Reaction on Rh(111) Surfaces: A precursor-Mediated Reaction

Autor:	Tetsuo Katayama, Ikuyo Nakai, Reona Yokota, Hideo Orita, Toshiaki Ohta, Hiroshi Kondoh, Kenta Amemiya, Masanari Nagasaka, Toru Shimada
Rok vydání:	2009
Předmět:	Dimer chemistry.chemical_element Nitrogen XANES Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Crystallography General Energy Monomer chemistry Physical and Theoretical Chemistry Absorption (chemistry) Spectroscopy
Zdroj:	The Journal of Physical Chemistry C. 113:13257-13265
ISSN:	1932-7455 1932-7447
DOI:	10.1021/jp902583x
Popis:	We studied the mechanism of the N + NO reaction on Rh(111) surfaces by means of near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Atomic nitrogen layers on Rh(111) were titrated with NO at various temperatures. Below 350 K, the chemisorbed NO monomer does not react with N, while the NO dimer formed in the second layer acts as an extrinsic precursor to the reaction: N(a) + (NO)2(a) → N2O(g) + NO(a). Because of a dominant role of the precursor-mediated mechanism, the reaction proceeds slower with an increase in temperature. Above 350 K, the reaction switches to a different path: N(a) + NO(a) → N2(g) + O(a).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::706ef66966a1ae482496aa8e036b5bf9 https://doi.org/10.1021/jp902583x Zobrazit plný text záznamu