Influences of Ion Implantation Damages on Elevated Source/Drain Formation for Ultra-Thin Body SOI MOSFET
| Autor: | Mitsumasa Koyanagi, Jicheol Bea, Hyuckjae Oh, T. Fukusima, Takeshi Sakaguchi |
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| Rok vydání: | 2005 |
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| Zdroj: | Extended Abstracts of the 2005 International Conference on Solid State Devices and Materials. |
| DOI: | 10.7567/ssdm.2005.p1-17 |
| Databáze: | OpenAIRE |
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