Optical, structural and electrical properties of tin oxide films prepared by magnetron sputtering

Autor: D.M. Mukhamedshina, N.B. Beisenkhanov, K.A. Mit, I.A. Karapatnitski
Rok vydání: 2002
Předmět:
Zdroj: Surface and Coatings Technology. :76-81
ISSN: 0257-8972
DOI: 10.1016/s0257-8972(01)01611-5
Popis: Films with thickness of 150–450 nm were deposited at a rate of 0.5 A/s in an argon–oxygen atmosphere on polycrystalline corundum, quartz and glass slides. The films were annealed in air at temperature 550 °C for 0.5, 1, 2, 4 and 8 h to stabilize their parameters. A correlation between the electrical resistivity and optical and structural properties of the films was found. Transparent films for wavelengths in the range 200–1200 nm as well as gas-sensitive films for sensors were obtained.
Databáze: OpenAIRE