Calibration of the isolated oxygen interstitial localized vibrational mode absorption line in GaAs
Autor: | R. E. Kremer, S. T. Neild, Marek Skowronski |
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Rok vydání: | 1991 |
Předmět: | |
Zdroj: | Applied Physics Letters. 58:1545-1547 |
ISSN: | 1077-3118 0003-6951 |
DOI: | 10.1063/1.105173 |
Popis: | A series of isochronal annealing experiments have been performed on bulk GaAs crystals doped with oxygen. Two centers induced by oxygen, the isolated oxygen interstitial (Oi) and the gallium‐oxygen‐gallium (Ga‐O‐Ga) defect, most likely due to oxygen interstitial‐arsenic vacancy complex, were monitored using localized vibrational mode absorption. The Ga‐O‐Ga center dissociates at temperatures above 650 °C resulting in an increase of the Oi concentration. Using the known oscillator strength of Ga‐O‐Ga transition, the calibration factor between integrated absorption and concentration of isolated oxygen interstitial was determined to be 8×1016 cm−1. The observed increase of absorption bands of both defects after high‐temperature annealing indicates that other types of oxygen‐containing defects are present. |
Databáze: | OpenAIRE |
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