| Autor: |
William J. Dauksher, David P. Mancini, D. J. Resnick, R. W. Brocato, Jack L. Skinner, A. Alec Talin, Ngoc V. Le, K. Gehoski, D. W. Palmer, Gregory Frank Cardinale, Kevin J. Nordquist |
| Rok vydání: |
2004 |
| Předmět: |
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| Zdroj: |
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22:3265 |
| ISSN: |
0734-211X |
| Popis: |
We report the surface acoustic wave (SAW) correlator devices fabricated using nanoimprint lithography. Using step-and-flash imprint lithography (S-FIL), we produced SAW correlator devices on 100mm diameter z-cut LiNbO3 devices and an aluminum metal etch process. On the same chip layout, we fabricated SAW filters and compared both the filters and correlators to similar devices fabricated using electron-beam lithography (EBL). Both S-FIL- and EBL-patterned correlators and SAW filters were analyzed using a bit-error rate tester to generate the signal and a parametric signal analyzer to evaluate the output. The NIL filters had an average center frequency of 2.38GHz with a standard deviation of 10MHz. The measured insertion loss averaged −31dB. In comparison, SAW filters fabricated using EBL exhibited a center frequency of 2.39GHz and a standard deviation of 100kHz. Based on our preliminary results, we believe that S-FIL is an efficient and entirely viable fabrication method to produce quality SAW filters and ... |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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