Advanced Surface Cleaning Strategy for 65nm CMOS Device Performance Enhancement
| Autor: | Kathy Barla, R. El-Farhane, A. Beverina, H. Bernard, Franck Arnaud, Didier Lévy, B. Duriez |
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| Rok vydání: | 2005 |
| Předmět: |
Materials science
Dopant Silicon business.industry Transistor chemistry.chemical_element Nanotechnology Condensed Matter Physics Surface cleaning Atomic and Molecular Physics and Optics PMOS logic law.invention chemistry CMOS law Optoelectronics General Materials Science Performance enhancement business NMOS logic |
| Zdroj: | Solid State Phenomena. :37-40 |
| ISSN: | 1662-9779 |
| Popis: | This paper investigates low temperature cleaning steps solutions (T° |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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