Hydrogen microwave plasma etching of silicon dioxide at high temperatures with in situ low-coherence interferometry control

Autor:	V. Yu Yurov, A.P. Bolshakov, A.S. Altakhov, I.A. Fedorova, E.V. Zavedeev, A.F. Popovich, V.G. Ralchenko
Rok vydání:	2022
Předmět:	Condensed Matter Physics Instrumentation Surfaces Coatings and Films
Zdroj:	Vacuum. 199:110939
ISSN:	0042-207X
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6e9725df85225765dc7b021ed3da8827 https://doi.org/10.1016/j.vacuum.2022.110939 Zobrazit plný text záznamu Full Text from ScienceDirect