Low-leakage diode string designs using triple-well technologies for RF-ESD applications
Autor: | Tung-Yang Chen, Jen-Kon Chen, Chiu-Hsiang Chou, Tien-Hao Tang, Shiao-Shien Chen |
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Rok vydání: | 2003 |
Předmět: | |
Zdroj: | IEEE Electron Device Letters. 24:595-597 |
ISSN: | 1558-0563 0741-3106 |
Popis: | This letter proposes a novel low-leakage diode string designs using triple-well technologies in 0.18-/spl mu/m CMOS process for RF-electrostatic discharge (RF-ESD) applications. Based on the characteristics of the low-leakage current and low-capacitance in the triple-well diode string, it is convenient to apply it in RF-ESD (electrostatic discharge) protection circuit designs. As compared to the conventional p/sup +//n-well diode string, the substrate leakage current can be kept very small all the time before the triple-well diode string turns on. It results from the existence of the parasitic base-emitter tied p-n-p bipolar transistor in each triple-well diode. |
Databáze: | OpenAIRE |
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