Low-temperature atmospheric discharge plasma and its applications for the surface treatment
| Autor: | Kunihito Tanaka, Masuhiro Kogoma |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Glow discharge
Materials science Atmospheric pressure chemistry.chemical_element General Medicine Plasma 01 natural sciences Chemical reaction Nitrogen 010305 fluids & plasmas Chemical engineering chemistry 0103 physical sciences Deposition (phase transition) Wafer 010303 astronomy & astrophysics Helium |
| Zdroj: | Reviews of Modern Plasma Physics. 5 |
| ISSN: | 2367-3192 |
| Popis: | The atmospheric pressure low-temperature homogeneous discharge using helium and nitrogen, both known for industrial applications, was reviewed. In case of helium, metastable atoms (21s and 23s) produced in the glow discharge were able to dissociate mixed molecular gases to produce radicals or atoms. Radical species undergo chemical reactions, such as oxidation or nitration reaction and form products on the electrode surfaces. Applications of helium atmospheric pressure glow discharge including surface treatment of plastic films to enhance adhesibility with glue, weakening strength with pressure-sensitive glue, and deposition of solid material on a flat plate or powder surfaces, were described. Moreover, the microwave low-temperature discharge using nitrogen, as a cost-saving carrier gas, were introduced for the surface cleaning of silicon wafer. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink