XPS, Raman spectroscopy, X-ray diffraction, specular X-ray reflectivity, transmission electron microscopy and elastic recoil detection analysis of emissive carbon film characterization
| Autor: | G. Rolland, Denis Rouchon, C Vergnaud, C. Vannuffel, M. N. Séméria, J. Baylet, A. Chabli, F. Pierre, A. Ermolieff |
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| Rok vydání: | 2001 |
| Předmět: |
Materials science
Analytical chemistry Surfaces and Interfaces General Chemistry Condensed Matter Physics Surfaces Coatings and Films Pulsed laser deposition X-ray reflectivity Elastic recoil detection Field electron emission symbols.namesake Carbon film X-ray photoelectron spectroscopy Materials Chemistry symbols Thin film Raman spectroscopy |
| Zdroj: | Surface and Interface Analysis. 31:185-190 |
| ISSN: | 0142-2421 |
| Popis: | For a better understanding of the physical and electronic properties of emissive carbon films, one of the best ways is to compare the results obtained with several surface and structural analysis techniques. In this article, different types of carbon film depositions for developing large flat panel displays by field emission displays are analysed and the results are correlated with their emissivity. Pulse laser ablation films, high-temperature plasma-enhanced chemical vapour deposition (PECVD) films and low-temperature PECVD films are characterized by XPS, Raman spectroscopy, X-ray diffraction (XRD), specular X-ray reflectivity, transmission electron microscopy (TEM) and elastic recoil detection analysis (ERDA). The analyses lead us to conclude that the sp 2 /sp 3 ratio is not a crucial parameter for carbon film emissivity. Crystalline structure seems more important. The presence of graphite grains is essential for good and uniform emission. Combination of XPS, TEM, XRD, Raman spectroscopy and ERDA is necessary for the study of carbon film emission. |
| Databáze: | OpenAIRE |
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