Formation of fast neutral beams and their using for selective etching
Autor: | V. P. Kudrya, S. L. Shevchuk, Yu. P. Maishev |
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Rok vydání: | 2014 |
Předmět: | |
Zdroj: | SPIE Proceedings. |
ISSN: | 0277-786X |
DOI: | 10.1117/12.2180434 |
Popis: | Design and main characteristics of high performance fast neutral beam sources based on the ion sources with a cold cathode and a closed drift of electrons in crossed electrical and magnetic fields are described. The output beam is of practically 100% neutrality and has a low level of divergence ( |
Databáze: | OpenAIRE |
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