Bit Patterned Media at 1 Tdot/in2 and Beyond

Autor:	Dan S. Kercher, Jeffrey S. Lille, Daniel Bedau, Kanaiyalal C. Patel, Dieter Weller, Manfred Ernst Schabes, E. Dobisz, Lei Wan, He Gao, Ricardo Ruiz, Michael Grobis, Tsai-Wei Wu, Olav Hellwig, Thomas R. Albrecht, Ernesto E. Marinero
Rok vydání:	2013
Předmět:	Materials science Fabrication business.industry Soft lithography Electronic Optical and Magnetic Materials Nanoimprint lithography law.invention Nanolithography law Patterned media Optoelectronics Electrical and Electronic Engineering Thin film business Lithography Electron-beam lithography
Zdroj:	IEEE Transactions on Magnetics. 49:773-778
ISSN:	1941-0069 0018-9464
DOI:	10.1109/tmag.2012.2227303
Popis:	Bit patterned media (BPM) provide an alternative to conventional granular thin film recording media, circumventing the challenges of managing grain size and its associated noise and thermal stability issues in granular media. A viable fabrication strategy involves creation of a master pattern by rotary-stage e-beam lithography and directed self-assembly of block copolymers, followed by pattern replication via UV-cure nanoimprint lithography and pattern transfer to a magnetic thin film by ion beam etching. These steps have been demonstrated for 150 Gdot/cm2 (1 Tdot/in2) hcp patterns, achieving a dot placement tolerance of 1.2 nm 1σ and a defect rate of ; 1. A master pattern generation generation strategy for BAR>; 1 with rectangular islands is shown using intersecting lines generated by directed self-assembly of lamellar block copolymers in combination with spacer-defined line doubling.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6e1878e6641f67b5a5815a7270117b39 https://doi.org/10.1109/tmag.2012.2227303 Zobrazit plný text záznamu