| Popis: |
Auger depth profiles are used to compare sputtered Ti, reactively sputtered TiN, and TiN/Ti bilayer films in submicron (0.8 and 0.4 μm) contact/via holes, deposited with and without a collimator. Samples were cleaved and mounted to minimize difficulties associated with the sputter profiling of and data acquisition from recessed features. The Ti and N concentrations were calculated with a subtract‐and‐weight routine which uses dN(E)/d(E) peak‐to‐peak intensities. Transmission electron microscopy film thicknesses measurements were used to confirm that the sputter rates were comparable for the various sample mounting geometries. The thickness of films deposited on the contact base, relative to those on the surrounding oxide was greater when the collimator was used. For 0.8 μm contacts, the film thickness ratio obtained using the collimator was nearly twice that obtained with the uncollimated deposition (0.5 versus 0.25 for TiN; 0.8 versus 0.6 for Ti). The benefits of the collimator, for obtaining good covera... |
