Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films

Autor:	Mikko Ritala, Jun Lu, H. Khanduri, Viljami Pore, Lars Hultman, Mukesh C. Dimri, Markku Leskelä, Raivo Stern, Kaupo Kukli
Rok vydání:	2011
Předmět:	inorganic chemicals 010302 applied physics Oxide minerals Materials science Inorganic chemistry technology industry and agriculture Metals and Alloys chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces 021001 nanoscience & nanotechnology 01 natural sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Titanium oxide Atomic layer deposition chemistry 0103 physical sciences Materials Chemistry Atomic layer epitaxy Thin film 0210 nano-technology Cobalt Cobalt oxide Titanium
Zdroj:	Thin Solid Films. 519:3318-3324
ISSN:	0040-6090
DOI:	10.1016/j.tsf.2011.01.191
Popis:	TiO2 thin films doped or mixed with cobalt oxide were grown by atomic layer deposition using titanium tetramethoxide and cobalt(III)acetylacetonate as metal precursors. The films could be deposited ...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6defd026eb95ef41c4c9ae568e4aed3c https://doi.org/10.1016/j.tsf.2011.01.191 Zobrazit plný text záznamu Full Text from ScienceDirect