Depth profiling of Hf-doped aluminide coating by glow-discharge mass spectrometry

Autor:	J. D. Meyer, Larry R Walker, K. Putyera, L. M. He, Woo Y. Lee
Rok vydání:	2002
Předmět:	Glow discharge Glow Discharge Mass Spectrometry Materials science Nickel hydride Metallurgy Doping Metals and Alloys engineering.material Condensed Matter Physics Mass spectrometry Coating Mechanics of Materials Metallic materials engineering Aluminide
Zdroj:	Metallurgical and Materials Transactions A. 33:3578-3582
ISSN:	1543-1940 1073-5623
DOI:	10.1007/s11661-002-0348-2
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6db0014c8ff2bef30d6ce48a1fa1ea4b https://doi.org/10.1007/s11661-002-0348-2 Zobrazit plný text záznamu Full text from SpringerLink