Research on photomask process for FPD
| Autor: | Kouichi Murakami, Takumi Uemura, Shuichi Ojima |
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| Rok vydání: | 2019 |
| Předmět: | |
| Zdroj: | Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology. |
| DOI: | 10.1117/12.2533422 |
| Popis: | FSCE focused on resist materials and coordinate correction technology for FPD mask and carried out research on underlying technology. The results we obtained are reported. |
| Databáze: | OpenAIRE |
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