X-Ray Diffraction Analysis of Epigrowth on Porous 4H-SiC Substrates

Autor: Rositza Yakimova, Mikael Syväjärvi, V.B. Shuman, V.V. Ratnikov, I.L. Shulpina, N.S. Savkina
Rok vydání: 2005
Předmět:
Zdroj: Materials Science Forum. :265-268
ISSN: 1662-9752
DOI: 10.4028/www.scientific.net/msf.483-485.265
Popis: The methods of X-ray topography and diffractometry have been applied to characterize the structure of epilayers grown on porous layers. Two geometrical configurations of defects determined to be stacking faults (SF) were revealed: i) with the images of triangular shape with the edge size 560 µm along the directions; ii) linear shape along the [11-20] direction. The sources of SFs are located within the epilayer and start from the epilayer / porous layer interface. We propose that the source of SFs is connected with graphitization of porous layer at the temperature of epitaxy.
Databáze: OpenAIRE