Study on Influence of X-Ray Beam Spot Intensity on EDXRF Analytical Precision

Autor:	李野 Li Ye, 王国政 Wang Guozheng, 秦旭磊 Qin Xu-lei, 宋忠华 Song Zhonghua, 刘有银 Liu Youyin, 端木庆铎 Duanmu Qing-duo, 李珅 Li Shen
Rok vydání:	2015
Předmět:	Optics Materials science business.industry Spot intensity X ray beam business Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials
Zdroj:	Acta Optica Sinica. 35:0230002
ISSN:	0253-2239
DOI:	10.3788/aos201535.0230002
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6d7e759f60f7fcdcd1f4c892e34a57ac https://doi.org/10.3788/aos201535.0230002 Zobrazit plný text záznamu