Multi-MeV accelerator system for ion implantation

Autor:	Alireza Nassiri, Deepak Raparia, Charles A. Swenson, Daryl DiBitonto, F.R. Huson, Peter McIntyre
Rok vydání:	1987
Předmět:	Nuclear and High Energy Physics Ion implantation Ion beam deposition Materials science Ion beam Quadrupole Physics::Accelerator Physics Atomic physics Penetration depth Instrumentation Ion source
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :783-786
ISSN:	0168-583X
DOI:	10.1016/s0168-583x(87)80246-x
Popis:	Ion implantation makes possible dramatic improvements in the surface properties of metals. For many applications the required penetration depth is several m, corresponding to an ion beam energy of several MeV. This paper describes the design of a compact, efficient accelerator system for such applications. The system is based on a MEVVA ion source and a high gradient rf quadrupole design.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6d324e047c8dbc183aeecf6c70cc776f https://doi.org/10.1016/s0168-583x(87)80246-x Zobrazit plný text záznamu