Application and control of Laser Anneal at the 65 and 45 nm node

Autor:	M. Hurley, J. Willis, R. Van Roijen, O. Gluchenkov
Rok vydání:	2009
Předmět:	Materials science Temperature control Semiconductor device fabrication Annealing (metallurgy) business.industry Laser law.invention Semiconductor laser theory law Rapid thermal processing Hardware_INTEGRATEDCIRCUITS Process control Optoelectronics Rapid thermal annealing business
Zdroj:	2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.
Popis:	The application of Laser Anneal to semiconductor manufacturing is shown to have advantages and challenges for process control. We discuss some results, the implications of the real-time control mechanism on the Ultratech anneal tool, the impact of patterning effects and the use of inline data to ensure the tool achieves the target anneal condition.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6ce067e603c33ce893b6b2c15d0d2119 https://doi.org/10.1109/asmc.2009.5155986 Zobrazit plný text záznamu