Step-and-scan maskless lithography for ultra large scale DNA chips
| Autor: | Franco Cerrina, Omar D. Negrete |
|---|---|
| Rok vydání: | 2008 |
| Předmět: |
Materials science
Microscope business.industry Nanotechnology Image plane Condensed Matter Physics Chip Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Digital micromirror device law Optoelectronics Electrical and Electronic Engineering Stepper Photolithography business Lithography Maskless lithography |
| Zdroj: | Microelectronic Engineering. 85:834-837 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/j.mee.2008.01.014 |
| Popis: | A maskless photolithography test bed was constructed to examine the requirements for stepper-based synthesis of Ultra Large Scale DNA chips (ULS-DNA chips). The test bed is based on a microscope optical layout with a 5iÂ?reduction imaging lens and micro/nano controlled staging at the image plane. Spatial light modulation is enabled by a Digital Micromirror Device (Texas Instruments DMD 0.7XGA) and the positioning system is composed of a piezoelectric nano-positioner (nPoint Inc., Madison, WI) mounted on a high precision linear-motor stage (Newport Corp., Irvine, CA). With this test bed we examined the requirements of overlay and alignment in a stepper-based DNA microarray synthesis system. We demonstrated multi-field chip synthesis with a spot size of 3.15µm at the 5iÂ?reduction. All tests were verified by standard hybridization, and fluorescence microscopy. In addition to our demonstration of step-and-scan lithography for DNA chip synthesis, we drafted and modeled an imaging optic for a production scale tool capable of synthesizing DNA chips containing up to 20 million pixels. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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