The Hydrogen Content and Properties of SiO2 Films Deposited from Tetraethoxysilane at 27 MHz in Various Gas Mixtures

Autor:	M. G. J. Vepřek‐Heijman, D. Boutard
Rok vydání:	1991
Předmět:	Chemical engineering Renewable Energy Sustainability and the Environment Chemistry Materials Chemistry Electrochemistry Hydrogen content Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Nuclear chemistry
Zdroj:	Journal of The Electrochemical Society. 138:2042-2046
ISSN:	1945-7111 0013-4651
DOI:	10.1149/1.2085920
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6c1de97592cc7e695e5ee4c328e5e2bb https://doi.org/10.1149/1.2085920 Zobrazit plný text záznamu