High-Endurance (>1011cycles) and Thermally-Stable Sub-100nm TiO2 Channel FeFET for Low-Power Memory Centric 3D-LSI Applications

Autor:	Taro Shiokawa, Reika Ichihara, Takamasa Hamai, Kiwamu Sakuma, Kota Takahashi, Kazuhiro Matsuo, Masumi Saitoh
Rok vydání:	2023
Zdroj:	2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6bd5a2fedcd5da8808a96f28ae0b7c42 https://doi.org/10.1109/edtm55494.2023.10103063 Zobrazit plný text záznamu