Current status and future directions of SOI technology
| Autor: | Makoto Yoshimi |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
Flexibility (engineering)
Engineering business.industry Electrical engineering Silicon on insulator Hardware_PERFORMANCEANDRELIABILITY Condensed Matter Physics Electronic Optical and Magnetic Materials CMOS MOSFET Hardware_INTEGRATEDCIRCUITS Materials Chemistry Electronic engineering Electrical and Electronic Engineering Current (fluid) business Scaling |
| Zdroj: | Solid-State Electronics. 46:951-958 |
| ISSN: | 0038-1101 |
| DOI: | 10.1016/s0038-1101(02)00030-8 |
| Popis: | Current status and future directions of SOI technology are reviewed, by discussing advantages and issues to be solved for MPU, RF, and other low-power applications. The possibility of future MOSFET scaling is also discussed for novel SOI device structures based on modified scaling scenarios. It is recognized that the progress of SOI technology is adding CMOS technology unique flexibility and possibilities, which are both expected to provide useful countermeasures for circumventing the present scaling crisis. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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