Manufacturing of nanostructures in silicon carbide using UV-nanoimprint lithography in combination with fluorine-based plasma etching

Autor:	Thomas Handte, Martin Hofmann, Arne Behrens, Stefan Sinzinger
Rok vydání:	2022
Zdroj:	2022 IEEE Photonics Conference (IPC).
DOI:	10.1109/ipc53466.2022.9975596
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6b9ec14789bab92ce81c3114f2ca7adb https://doi.org/10.1109/ipc53466.2022.9975596 Zobrazit plný text záznamu