| Autor: |
Raymond A. Adomaitis, Gary W. Rubloff, Laurent Henn-Lecordier, Yuhong Cai, Jae-ouk Choo |
| Rok vydání: |
2004 |
| Předmět: |
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| Zdroj: |
Proceedings of the 2004 American Control Conference. |
| Popis: |
This work describes the continuing design evolution of a new approach to spatially controllable chemical vapor deposition for electronic materials manufacturing. Based on the success of a previous prototype reactor, we describe construction of a newer version of the prototype reactor system to assess its performance and identify its key operational characteristics. This new design includes a fully automated feed gas control system, allowing the reprogramming of reactor operation without hardware modifications and a time-shared gas sampling mass spectrometer for spatially resolved across-wafer gas composition analysis. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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