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Spectroscopic ellipsometry has long been recognized as a powerful technique to characterize thins films and multilayer structures. It is now routinely used for non-destructive on-line characterization of semiconductor process. SOPRALAB leader in commercial spectroscopic ellipsometry for research and development, has already developed an infrared ellipsometer as an option on visible instrument to provide the largest wavelength range available up to now (from deep UV 190 nm to far infrared up to 28 μm). The instrument is presented here which includes a small spot size to get ride of the problems of back face reflection on silicon wafers, and an improved signal/noise ratio to allow rapid measurements compatible with an industrial environment. Some examples of application concerning thin films in polymer, dopant density, conductivity and sheet resistance in epilayers, composition of low k dielectrics and polymers are presented. |
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