Etch Characteristics and Mechanism of TiSbTe Thin Films in Inductively-Coupled HBr-He, Ar, N2, O2Plasma

Autor:	Yipeng Chan, Gaoming Feng, Zhen Xu, Dan Gao, Bo Liu, Weiwei Wang, Juntao Li, Qing Wang, YaoHui Zhou, Lei Wang, Zhitang Song, Yangyang Xia, Songlin Feng
Rok vydání:	2016
Předmět:	010302 applied physics O2 plasma Materials science Chemical engineering 0103 physical sciences 02 engineering and technology Thin film 021001 nanoscience & nanotechnology 0210 nano-technology 01 natural sciences Mechanism (sociology) Electronic Optical and Magnetic Materials
Zdroj:	ECS Journal of Solid State Science and Technology. 5:P330-P334
ISSN:	2162-8777 2162-8769
DOI:	10.1149/2.0201606jss
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6ac7bcd888e042cdaf213d5da12e1f73 https://doi.org/10.1149/2.0201606jss Zobrazit plný text záznamu