Ordered Si Micropillar Arrays via Carbon-Nanotube-Assisted Chemical Etching for Applications Requiring Nonreflective Embedded Contacts

Autor:	Mohadeseh A. Baboli, Brian J. Landi, Ian L. Kecskes, Ivan Puchades, Parsian K. Mohseni, Thomas S. Wilhelm, Alireza Abrand, Michael S. Pierce
Rok vydání:	2019
Předmět:	Materials science Semiconductor device fabrication law General Materials Science Nanotechnology Dry etching Carbon nanotube Isotropic etching law.invention
Zdroj:	ACS Applied Nano Materials. 2:7819-7826
ISSN:	2574-0970
DOI:	10.1021/acsanm.9b01838
Popis:	Metal-assisted chemical etching (MacEtch, MACE) has been heralded as a robust and cost-effective semiconductor fabrication technique that combines many advantages of wet and dry etching, while simu...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6ab01edb92d298500fc5d537e7945bd8 https://doi.org/10.1021/acsanm.9b01838 Zobrazit plný text záznamu