Large-area fabrication of equidistant free-standing Si crystals on nanoimprinted glass

Autor:	Carola Klimm, Peter Schubert-Bischoff, Bernd Rech, Tobias Sontheimer, Eveline Rudigier-Voigt, Christiane Becker, Matthias Bockmeyer
Rok vydání:	2011
Předmět:	Fabrication Materials science Silicon chemistry.chemical_element Nanotechnology Condensed Matter Physics Evaporation (deposition) Nanoimprint lithography law.invention Amorphous solid chemistry law Solar cell General Materials Science Thin film Photonic crystal
Zdroj:	physica status solidi (RRL) - Rapid Research Letters. 5:376-378
ISSN:	1862-6254
Popis:	By combining nanoimprint lithography with the emerging high-rate deposition technique electron-beam evaporation of amorphous Si, we developed a low-cost fabrication process for the design of periodic arrays of Si crystals on large areas of 50 cm2 in a solid phase crystallization and subsequent selective etch process. The method allows for precise control over the feature size of the crystals. The promising absorption properties of the features and the versatility and simplicity of the preparation process inspire the development of three-dimensional solar cell architectures and tailored large-area photonic crystals. Cross-sectional SEM image of periodic arrays of Si crystals on nanoimprinted glass (© 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6aa3f4aff908f823da106333251d2dee https://doi.org/10.1002/pssr.201105437 Zobrazit plný text záznamu Plný text