Design considerations for a compact proton beam writing system aiming for fast sub-10 nm direct write lithography
| Autor: | Anjam Khursheed, Sarfraz Qureshi, Jeroen A. van Kan, P. Santhana Raman, Rudy Pang, Nannan Liu, Xinxin Xu |
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| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
Nuclear and High Energy Physics Materials science business.industry 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Proton beam writing law.invention Lens (optics) Optics law 0103 physical sciences Optoelectronics Laser beam quality 0210 nano-technology business Instrumentation Lithography Electron-beam lithography Next-generation lithography Beam (structure) Maskless lithography |
| Zdroj: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 404:243-249 |
| ISSN: | 0168-583X |
| DOI: | 10.1016/j.nimb.2016.12.031 |
| Popis: | In order to realize sub-10 nm feature size by proton beam writing (PBW) with writing speed comparable to electron beam lithography (EBL), a 200 kV compact PBW system is proposed here. In this system, a new nano-aperture electron impact ion source with a potential reduced brightness of 106 A/(m2 srV) will be employed. To achieve sub-10 nm spot sizes with pA beam current, two different focusing lens configurations were evaluated. Both of these configurations were found to be theoretically capable of achieving sub-10 nm beam spot size. |
| Databáze: | OpenAIRE |
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