Deposition Condition Effects of SiNx∶H film on TFT Characteristics of a-Si TFT

Autor:	闵泰烨 Min Tai-ye, 阎长江 Yan Chang-jiang, 李婧 Li Jing, 张金中 Zhang Jin-zhong, 陈旭 Chen Xu, 谢振宇 Xie Zhen-yu
Rok vydání:	2013
Předmět:	Materials science business.industry Thin-film transistor Signal Processing Optoelectronics business Instrumentation Deposition (chemistry) Electronic Optical and Magnetic Materials
Zdroj:	Chinese Journal of Liquid Crystals and Displays. 28:547-551
ISSN:	1007-2780
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6a8e4ddaf7acc8668ba465368e4d56f8 https://doi.org/10.3788/yjyxs20132804.0547 Zobrazit plný text záznamu