Non-contact, in-line monitoring of low dose and low energy ion implantation

Autor:	W.M. Moller, R.S. Santiesteban, D.K. DeBusk, D.A. Ramappa
Rok vydání:	2003
Předmět:	Ion implantation Materials science CMOS business.industry Surface photovoltage Doping Electronic engineering Optoelectronics Condition monitoring Wafer business Sheet resistance Voltage
Zdroj:	2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).
DOI:	10.1109/iit.2000.924226
Popis:	Cycle time and cost demands associated with ultra-large and giga-scale integration have fueled the need for cost effective, fast, and accurate in-line characterization techniques across all processing areas. The work presented here, is a discussion of the capabilities of new generation non-contact tools to include low dose (
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6a6d81a404d26a9fb174099594d79241 https://doi.org/10.1109/iit.2000.924226 Zobrazit plný text záznamu