Evidence of Reduced Self Heating with Partially Depleted SOI MOSFET Scaling
Autor: | Georges Guegan, O. Gonnard, Simon Deleonibus, Mikael Casse, Gilles Gouget, Romain Gwoziecki, Christine Raynaud |
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Rok vydání: | 2006 |
Předmět: | |
Zdroj: | MRS Proceedings. 913 |
ISSN: | 1946-4274 0272-9172 |
DOI: | 10.1557/proc-0913-d03-02 |
Popis: | SOI technology offers advantages over bulk silicon and become a good candidate for analog/RF applications. However, the presence of a buried oxide causes self-heating which can degrade the device performance. The effects of self-heating have been examined on two successive generations with a wide range of device dimensions. This work shows that self-heating effects become less and less severe with both MOSFET and power supply voltage scaling. Moreover, we have observed a weak increase of 100 nm pMOSFET output characteristics due to the self-heating. |
Databáze: | OpenAIRE |
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