The influence of deposition temperature on growth mode, optical and mechanical properties of ZnO films prepared by the ALD method

Autor:	N.Y. Yuan, S.Y. Wang, J.N. Ding, Guang-Gui Chen, C.B. Tan, Xinqiang Wang
Rok vydání:	2013
Předmět:	Inorganic Chemistry Diffraction Atomic layer deposition Photoluminescence Materials science Materials Chemistry Analytical chemistry Growth rate Thin film Condensed Matter Physics Nanocrystalline material Spectral line Deposition temperature
Zdroj:	Journal of Crystal Growth. 366:43-46
ISSN:	0022-0248
DOI:	10.1016/j.jcrysgro.2012.12.024
Popis:	Nanocrystalline ZnO thin films were deposited on glass substrates via the atomic layer deposition (ALD) method at different temperatures ranging from 50 to 200 °C. The influences of deposition temperature on the film growth mode, growth rate, optical and mechanical properties of the ZnO films were investigated. At a critical temperature of 100 °C, ZnO films exhibited a series of changes. X-ray diffraction (XRD), atomic force microscopy (AFM), UV–vis spectra, room temperature photoluminescence (PL) spectra and nano-indentation measurement were used to analyze these variations.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::69c44e2303d909f0946cb46a4d6b9f2e https://doi.org/10.1016/j.jcrysgro.2012.12.024 Zobrazit plný text záznamu Full Text from ScienceDirect