Dielectric properties of composition spread SiO2–Al2O3 mixed phase thin films deposited at room temperature by off-axis RF magnetron sputtering

Autor:	Kyung Bong Park, Seok-Jin Yoon, Yun Hoe Kim, Jonghan Song, Dong Wook Shin, Ji-Won Choi, Jin Sang Kim
Rok vydání:	2012
Předmět:	Materials science Process Chemistry and Technology Sio2 al2o3 Analytical chemistry Dielectric Sputter deposition Composition (combinatorics) Amorphous phase Surfaces Coatings and Films Electronic Optical and Magnetic Materials Materials Chemistry Ceramics and Composites Thin film Mixed phase
Zdroj:	Ceramics International. 38:S79-S82
ISSN:	0272-8842
DOI:	10.1016/j.ceramint.2011.04.054
Popis:	The dielectric properties of composition spread SiO 2 –Al 2 O 3 thin films deposited by off-axis radio-frequency magnetron sputtering at room temperature were explored to obtain optimized compositions, which have low dielectric constants and losses. The specific points (compositions) showing superior dielectric properties of low dielectric constants (8.13 and 9.12) and losses (tanδ ∼0.02) at 1 MHz were found in area of the distance of 25.0 mm (Al 2 Si 3 O 8 ) and 42 mm (Al 2.4 Si 3 O 8 ) apart from SiO 2 target side in 75 mm × 25 mm sized Pt/Ti/SiO 2 /Si(1 0 0) substrates, respectively. The specific thin films were amorphous phase and the compositions were Al 2 Si 3 O 8 ( k ∼8.13) and Al 2.4 Si 3 O 8 ( k ∼9.12).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::69aaee4b245f2b0fc9584642415cc562 https://doi.org/10.1016/j.ceramint.2011.04.054 Zobrazit plný text záznamu Full Text from ScienceDirect