Correction to: Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl3 and BF3

Autor:	I. B. Gornushkin, P. G. Sennikov, R. A. Kornev, A. A. Ermakov, V. E. Shkrunin
Rok vydání:	2020
Předmět:	General Chemical Engineering General Chemistry Condensed Matter Physics Surfaces Coatings and Films
Zdroj:	Plasma Chemistry and Plasma Processing. 40:1639-1640
ISSN:	1572-8986 0272-4324
DOI:	10.1007/s11090-020-10107-w
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::697d2304636495ea76eb0857179eca06 https://doi.org/10.1007/s11090-020-10107-w Zobrazit plný text záznamu Full text from SpringerLink