Challenges to Overcome Trade-off between High Resolution and High Sensitivity in EUV Lithography
| Autor: | Tomotaka Yamada, Katsumi Ohmori, Kensuke Matsuzawa, Daisuke Kawana, Shogo Matsumaru, Fujii Tatsuya, Yoshitaka Komuro |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Polymers and Plastics business.industry Extreme ultraviolet lithography Organic Chemistry High resolution 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Optics 0103 physical sciences Materials Chemistry Optoelectronics Sensitivity (control systems) 0210 nano-technology business |
| Zdroj: | Journal of Photopolymer Science and Technology. 29:489-493 |
| ISSN: | 1349-6336 0914-9244 |
| DOI: | 10.2494/photopolymer.29.489 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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