INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE

Autor:	P. Gkotsis, D.E. Rapakoulias, E. Katsia
Rok vydání:	2007
Předmět:	Deposition rate Materials science Silicon chemistry Chemical engineering chemistry.chemical_element Substrate (chemistry) General Medicine Plasma
Zdroj:	High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes). 11:467-475
ISSN:	1093-3611
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6909aba350e588d5e46ee363f6675894 https://doi.org/10.1615/hightempmatproc.v11.i3.130 Zobrazit plný text záznamu