Optical properties of metal oxynitride thin films grown with atmospheric plasma deposition
| Autor: | Reinhold H. Dauskardt, Michael Q. Hovish |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Acoustics and Ultrasonics Silicon Titanium ethoxide Analytical chemistry Tantalum chemistry.chemical_element Atmospheric-pressure plasma 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy 0103 physical sciences Capacitively coupled plasma Thin film 0210 nano-technology Titanium |
| Zdroj: | Journal of Physics D: Applied Physics. 49:395302 |
| ISSN: | 1361-6463 0022-3727 |
| DOI: | 10.1088/0022-3727/49/39/395302 |
| Popis: | Thin films of tantalum oxynitride (TaO x N y ) and titanium oxynitride (TiO x N y ) are deposited using atmospheric plasma deposition and a suite of optical properties are reported. Tantalum and titanium ethoxide are introduced into the afterglow of a radio-frequency capacitively coupled plasma, facilitating the growth of oxynitride films on silicon and polycarbonate at temperatures below 180 °C. The plasma power and nitrogen flow within the plasma are varied between 60 and 120 W and between 0.1 and 0.3 LPM respectively. We use spectroscopic ellipsometry to show that the optical properties of the metal oxynitride films grown in this study are comparable to those synthesized with sol–gel methods. Measurement of both the extinction coefficient and the transmission on polycarbonate substrates indicates good transparency in the visible wavelengths of light. Additionally, the refractive index increases when increasing the number of reactive nitrogen species within the discharge. We use x-ray photoelectron spectroscopy to correlate the higher indexes observed at large secondary gas flows to the presence of metal oxynitride bonding. Single layer anti-reflection coatings are deposited on silicon, with a five-fold and seven-fold reduction in reflection for TaO x N y and TiO x N y coatings, respectively. In total, we have found that the modulation of nitrogen concentration within the plasma discharge results in good control over optical constants. In addition, we observe similarities between films deposited with atmospheric plasma and those reported for sol–gel, indicating an alternative processing route where solution chemistries are currently applied. |
| Databáze: | OpenAIRE |
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