| Autor: |
Alain Ostrovsky, C. Lapeyre, B. Le-Gratiet, Marc Mikolajczak, Auguste Lam, B. Orlando, Alice Pelletier, B. Beraud, J. Ducote, Maxime Gatefait, J. Decaunes, Frank Sundermann |
| Rok vydání: |
2014 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.2064795 |
| Popis: |
Advanced CMOS nodes require more and more information to get the wafer process well setup. Process tool intrinsic capabilities are not sufficient to secure specifications. APC systems (Advanced Process Control) are being developed in waferfab to manage process context information to automatically adjust and tune wafer processing. The APC manages today Run to Run component from and between various process steps plus a sub-recipes/profiles corrections management. This paper will outline the architecture of an integrated/holistic process control system for a high mix advanced logic waferfoundry. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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