Ir–Zr alloys as diffusion barriers between Cu and Si(100)

Autor:	C. M. Gilmore, D. E. Ramaker, H. Yang
Rok vydání:	1993
Předmět:	Auger electron spectroscopy Materials science Amorphous metal Diffusion barrier Analytical chemistry Grain boundary diffusion coefficient Grain boundary Surfaces and Interfaces Crystallite Diffusion (business) Condensed Matter Physics Surfaces Coatings and Films Amorphous solid
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 11:1454-1457
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.578683
Popis:	Various Ir–Zr alloys were studied to determine their effectiveness in high temperature applications as diffusion barriers at a Cu/Si interface. Samples were characterized with x‐ray diffraction, Auger electron spectroscopy, Rutherford backscattering spectroscopy, and resistivity measurements. An amorphous Ir0.84Zr alloy was found to be a more effective diffusion barrier than a polycrystalline Ir2.85Zr alloy, indicating that grain boundary diffusion dominates in the Ir2.85Zr film. The films, typically about 3000 A thick, were found to serve as effective diffusion barriers for temperatures up to about 800 °C. The diffusion constants were determined at various temperatures, and the activation energy for Si out‐diffusion in Cu/Ir0.84Zr/Si was also obtained.
Databáze:	OpenAIRE
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