The influence of hydrogen at pressures up to 2000 Pa on the work function of Cu(111)
Autor: | G Reisfeld, I. T. Steinberger, D Shaltiel |
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Rok vydání: | 1995 |
Předmět: | |
Zdroj: | Journal of Physics: Condensed Matter. 7:2687-2696 |
ISSN: | 1361-648X 0953-8984 |
DOI: | 10.1088/0953-8984/7/14/009 |
Popis: | (111) surfaces of copper, grown epitaxially on a clean (001) face of a ruthenium crystal, were exposed to hydrogen or deuterium at pressures p up to 2000 Pa, at temperatures from 290 to 440 K. The concomitant changes of the work function phi were recorded photoelectrically. While coadsorbed impurities influenced the absolute value of phi , the slope d phi /dp was found to be roughly constant and independent of the temperature in the pressure range 400 |
Databáze: | OpenAIRE |
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