The influence of hydrogen at pressures up to 2000 Pa on the work function of Cu(111)

Autor: G Reisfeld, I. T. Steinberger, D Shaltiel
Rok vydání: 1995
Předmět:
Zdroj: Journal of Physics: Condensed Matter. 7:2687-2696
ISSN: 1361-648X
0953-8984
DOI: 10.1088/0953-8984/7/14/009
Popis: (111) surfaces of copper, grown epitaxially on a clean (001) face of a ruthenium crystal, were exposed to hydrogen or deuterium at pressures p up to 2000 Pa, at temperatures from 290 to 440 K. The concomitant changes of the work function phi were recorded photoelectrically. While coadsorbed impurities influenced the absolute value of phi , the slope d phi /dp was found to be roughly constant and independent of the temperature in the pressure range 400
Databáze: OpenAIRE